The emphasis for Manufacturing Science and Technology Group (MSTG) in 2021 is on atomically precise manufacturing and manufacturing AI hardware. As in previous years, other groups and divisions are co-sponsoring sessions with MSTG. As the dimensions of features in transistor and memory devices continue to shrink, atomic scale fabrication is becoming a necessity. The session titled Science and Technology for Atomically Precise Manufacturing will cover fabrication methods necessary for fabrication of digital electronics at an atomic scale such as Plasma and Surface Reactions and Few Monolayer Precision Engineering of Interfaces and Surfaces. An overview of the basic science needs for transforming manufacturing provides a view into the areas that AVS members can place emphasis in their future activities in atomically precise manufacturing. The impact of atomically precise manufacturing on bipolar 2D devices is also explored. This session is cosponsored by Atomically Precise Manufacturing, Nano Science, and Thin Films. The semiconductor industry is placing a significant emphasis on evolving next generation integrated circuits to improve their application to Artificial Intelligence (AI). MSTG also covers the fabrication of AI hardware including neuromorphic devices such as memristors and ReRAM. An overview of manufacturing R&D and ion tunable electronic materials both provide background for this topical area with is co-sponsored by AP.
MS+AP-MoA: Science and Technology of Manufacturing AI Hardware
- Nicholas Breil, Applied Materials Inc., ” ReRAM Device and Material Process Engineering for in-Memory Neuromorphic Computing Applications “
- Michael Lercel, ASML, “Virtual Presentation: Extending Semiconductor Patterning Into the Next Decade”
- Alec Talin, Sandia National Laboratories, “Ion Tunable Electronic Materials Systems for Neuromorphic Computing”
- Joshua Yang, University of Southern California, “Memristive Devices and Arrays as AI Hardware”
MS+AP+NS+TF-MoM: Science and Technology for Atomically Precise Manufacturing
- Parag Banerjee, University of Central Florida, “At the Edge of Thickness: ALD Enabled, Few Monolayer Precision Engineering of Interfaces and Surfaces”
- Cynthia Jenks, Oak Ridge National Laboratory, “Basic Science Needs for Transforming Manufacturing Through Atomically Precise Manufacturing”
- Shashank Misra, Sandia National Laboratories, USA, “Digital Electronics at the Atomic Scale”
- Tetsuya Tatsumi, Sony Semiconductor Solutions Corporation, Japan, “Control of Plasma and Surface Reactions for Atomically Precise Device Fabrication”
MS-TuP: Manufacturing Science and Technology Poster Session