Call for Abstracts Deadline: May 3, 2021
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  • Overview
    • Greetings & Introduction
    • Program Committee
    • AVS Code of Conduct
  • Symposia
    • Divisions
      • AS: Applied Surface Science
      • BI: Biomaterial Interfaces
      • EM: Electronic Materials and Photonics
      • MI: Magnetic Interfaces and Nanostructures
      • NS: Nanoscale Science and Technology
      • PS: Plasma Science & Technology
      • SE: Advanced Surface Engineering
      • SS: Surface Science
      • TF: Thin Film
      • VT: Vacuum Technology
    • Focus Topics
      • 2D: 2D Materials
      • AC: Actinides and Rare Earths
      • AP: Atomic Scale Processing
      • CA: Chemical Analysis and Imaging at Interfaces
      • EL: Spectroscopic Ellipsometry
      • HC: Fundamental Discoveries in Heterogeneous Catalysis
      • HI: Advanced Ion Microscopy & Ion Beam Nano-Engineering
      • LD: Leaders in Energy and The Environment
      • LS: New Trends in Structural Electronic Characterization of Materials, Interfaces, and Surfaces Using Synchrotron and FEL Based Light Sources
      • QS: Materials and Processes for Quantum Information Science
      • SM: Smart Multifunctional Materials for Nanomedicine
    • Groups
      • MN: MEMS and NEMS Technology
      • MS: Manufacturing Science and Technology
    • Special Sessions & Events
    • Manuscripts
  • Awards
    • Awards & Travel Grants
    • 2020 Awardees
  • Exhibits
  • Housing
  • Sponsors
    • Sponsorship Information
  • Abstract Submission
    • Call for Abstracts Overview (PDF)
    • Copyright Agreement

Division: Applied Surface Science (AS)

The Applied Surface Science Division provides a forum for research in surface preparation, modification, and utilization for practical applications with a focus on Characterization of Surfaces, Interfaces, and Nanomaterials. The Division has long been the premier gathering place for the global community of surface analysts with historic emphasis on techniques such as SIMS, XPS, and Auger spectroscopies. We have long-standing analytical interests with traditional sessions such as quantitative surface analysis, industrial problem solving and advances in technique development. Our contributors present a blend of fundamental research in measurement science along with cutting-edge applied studies in nanoscience, materials for energy conversion, semiconductor processing, polymers, biotechnology and more. We strive to grow in new areas for future development in applied surface analysis and analytical data processing. For AVS 67 we are also encouraging contributions focusing on the roles of surfaces and interfaces in materials, technologies, and processes relating to energy and the environment. Novel surface analytical methods for providing insight into surfaces, such as Atom Probe, Hard x-rays, Ellipsometry and in operando techniques are welcome. We also welcome and encourage contributions concerning reproducibility issues.

AS1+BI+CA+LS: Quantitative Surface Analysis

  • David Cant, National Physical Laboratory, UK, “Hard Targets : Developing Tools for Quantitative Haxpes”
  • Peter License, The University of Nottingham, UK, “Ionic Liquids in Vacuo: Suck-it and See!”

AS2+BI+CA+LS+NS+SE+SS: Analysis of Surfaces and Interfaces Related to Energy and the Environment

  • Julia Maibach, Karlsruhe Institut for Technology (KIT), Germany, “Batteries at Work: Ambient Pressure Photoelectron Spectroscopy for Lithium Ion Batteries”
  • Svitlana Pylypenko, Colorado School of Mines, “Analysis of Surfaces and Interfaces in Polymer Electrolyte Membrane Fuel Cell and Electrolyzer Devices”

AS3+AC+BI+CA: Getting the Most out of your Analysis using Complimentary Techniques

  • Alexander Gray, Temple University, “Combining Multiple X-Ray Spectroscopic and Scattering Techniques to Probe Emergent Electronic Phenomena at Oxide Interfaces”

AS4+HC+PS+SE+SM: Modification of Surfaces and Interfaces for Practical Applications

  • Robyn E. Goacher, Niagara University, “Going Beyond Superficial Surface Analysis for Transforming Plants into Value-added Products”

AS5+AC+BI+SS: Applied Surface Science and Data Processing

  • Brian Gorman, Colorado School of Mines, “Hardware and Data Analysis Methods for Integrating TEM and Atom Probe Tomography”

AS6+BI: Combining Depth Profiling with Surface Analysis

  • Birgit Hagenhoff, Tascon, Germany, “Towards Organic 3D Characterization: SIMS Analysis Using Ar Cluster Ions”

AS7: Charles S. Fadley Memorial Session (ALL INVITED SESSION)

  • Maria Asensio, Materials Science Institute of Madrid, Spain, “The Role of Photoelectron Diffraction Effects in Surface States at the Fermi Level: Revisiting the Si(111) 7×7 Surface”
  • Alexander Gray, Temple University, “Synergies between Synchrotron and Lab-Based X-Ray Techniques for the Studies of Complex Materials and Interfaces”
  • Martina Müller; Universität Konstanz, “Functional and Quantum Oxides Explored by Hard X-rays”
  • Bongjin Simon Mun, Gwangju Institute of Science and Technology, Republic of Korea, “Study of Surface Chemical Reactions With Ambient Pressure XPS”
  • Inna Vishik, University of California at Davis, “High Resolution Angle-Resolved Photoemission Spectroscopy Studies of Quantum Materials”

AS8: Applied Surface Science Division Poster Session

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Key Dates

Awards Nominations Deadlines:
March 31, 2021
(Student May 3, 2021)

Abstract Submission Deadline:
May 3, 2021

Housing Deadline:
September 30, 2021
(Opens August 2021)

Early Registration Deadline:
October 4, 2021
(Opens August 2021)

Downloads

  • Call for Abstracts Overview (PDF)
  • Copyright Agreement
  • Sponsor Form

Contact

Yvonne Towse
Conference Administrator
125 Maiden Lane; Suite 15B
New York, N.Y. 10038
yvonne@avs.org

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