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      • Divisions
        • AS: Applied Surface Science
        • BI: Biomaterial Interfaces
        • EM: Electronic Materials and Photonics
        • MI: Magnetic Interfaces and Nanostructures
        • NS: Nanoscale Science and Technology
        • PS: Plasma Science & Technology
        • SE: Advanced Surface Engineering
        • SS: Surface Science
        • TF: Thin Film
        • VT: Vacuum Technology
      • Focus Topics
        • 2D: 2D Materials
        • AC: Actinides and Rare Earths
        • AP: Atomic Scale Processing
        • CA: Chemical Analysis and Imaging at Interfaces
        • EL: Spectroscopic Ellipsometry
        • HC: Fundamental Discoveries in Heterogeneous Catalysis
        • HI: Advanced Ion Microscopy & Ion Beam Nano-Engineering
        • LD: Leaders in Energy and The Environment
        • LS: New Trends in Structural Electronic Characterization of Materials, Interfaces, and Surfaces Using Synchrotron and FEL Based Light Sources
        • QS: Materials and Processes for Quantum Information Science
        • SM: Smart Multifunctional Materials for Nanomedicine
      • Groups
        • MN: MEMS and NEMS Technology
        • MS: Manufacturing Science and Technology
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Focus Topic: Chemical Analysis and Imaging at Interfaces (CA)

Chemical and physical processes occurring at surfaces and gas-liquid, solid-liquid, and gas-solid interfaces are crucial for many applications and yet their analysis often represents grand scientific and engineering challenges. The Chemical Analysis and Imaging at Interfaces Focus Topic aims to survey and disseminate the latest developments in experimental methods and understanding of the interfacial physical and chemical processes relevant (but not limited) to materials synthesis, microfabrication, energy/catalysis research, biomedical applications, environmental sciences, and surface modifications, to name a few. In particular, in (ex-) situ/in vivo/operando chemical imaging, microscopy and spectroscopy studies using electron, X-ray, ion, neutron beams as well as optical methods and synchrotron radiation/ free-electron lasers facilities are strongly encouraged. Attention will also be paid to correlative spectroscopy and microscopy methods, modern image/spectra processing and machine learning techniques. Contributions are invited including but not limited to experimental, fundamental research, industrial R&D, novel analytical techniques/approaches and metrology of realistic surfaces and interfaces.

CA+2D+AS+BI+HC+LS+MN+NS+SM+SS-ThA: In Situ Microscopy, Spectroscopy and Processing at Liquid-Solid-Gas Interfaces II

  • Jinghua Guo, Lawrence Berkeley National Laboratory, “In-Situ/Operando Soft X-Ray Spectroscopy Characterization of Chemical Interfaces”
  • Robert Weatherup, University of Oxford, UK, “Probing Catalytic and Electrochemical Interfaces with Soft X-ray Spectroscopies under Real-world Conditions”

CA+2D+AS+BI+HC+LS+MN+NS+SM+SS-ThM: In Situ Microscopy, Spectroscopy and Processing at Liquid-Solid-Gas Interfaces I

  • Jong Min Yuk, Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea, “Development of Graphene Liquid Cells and Their Applications for In-Situ Electron Microscopy”
  • Haimei Zheng, Lawrence Berkeley National Lab, “In-Situ TEM Imaging of Nanoscale Reactions at Solid-Liquid-Gas Interfaces”

CA+2D+AS+MN+SE+SM+SS-FrM: Progress and Challenges in Industrial Applications (8:20 – 10:20 am)/Novel Developments and Approaches of Interfacial Analysis (10:20 – 11:40 am)

  • Joseph Dura, NIST Center for Neutron Research, “Neutron Reflectometry: In-Operando Depth Profiles of Buried Interfaces”
  • Andrei Fedorov, Georgia Institute of Technology, “Direct-Write Electron Beam Processing of Topologically Complex Functional Nanomaterials using Thermo-Electrically Energized Multiphase Precursor Jets”
  • Jeff Gelb, Sigray, Inc., “Emerging Techniques in Laboratory X-Ray Analysis”
  • Julia Zakel, IONTOF GmbH, Germany, “Virtual Presentation: Recent Innovations in Tof-Sims and Their Industrial Applications”

CA+AS+BI+MN+SM: Environmental Interfaces/Modeling and Multi-Dimensional Data Processing of Interfacial Processes

CA+AS+LS+MN+SS+VT-WeA: Environmental Interfaces (2:20 – 4:40 pm)/Modeling and Multi-Dimensional Data Processing of Interfacial Processes (4:40 – 6:00 pm)

  • Alex Belianinov, Center for Nanophase and Materials Sciences Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA, “Image Processing and Multivariate Analysis in Ion and Electron Microscopy Data”
  • Gilbert Nathanson, University of Wisconsin – Madison, “Virtual Presentation: Measuring the Depth Profiles of Surfactants, Ions, and Solvent at the Angstrom Scale”
  • Kevin Wilson, Lawrence Berkeley National Laboratory, “Interfacial Chemistry of Atmospheric Organic Aerosols and Droplets”
  • Michael Zwolak, NIST, “From Bulk to Constriction: Scaling Analysis of Ionic Transport Through Nanopores and Channels”

CA-On Demand: Chemical Analysis and Imaging at Interfaces On Demand Session

CA-ThP: Chemical Analysis and Imaging at Interfaces Poster Session

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Key Dates

Awards Nominations Deadlines:
March 31, 2021
(Student May 3, 2021)

Abstract Submission Deadline:
June 1, 2021
(Late Breaking August 31, 2021)

Early Registration Deadline:
October 4, 2021

Downloads

  • Copyright Agreement (PDF)
  • Presentation Instructions (PDF)
  • Sponsorship Form (PDF)
  • Technical Program (PDF)
  • Viewing Instructions (PDF)

Contact

Yvonne Towse
Conference Administrator
125 Maiden Lane; Suite 15B
New York, N.Y. 10038
yvonne@avs.org

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